aldsim

Name	aldsim JSON
Version	0.0.2 JSON
	download
home_page	https://github.com/anglyan/ald.git
Summary	Simple models for atomic layer deposition
upload_time	2024-06-05 00:27:22
maintainer	None
docs_url	None
author	Angel Yanguas-Gil
requires_python	>=3.6
license	None
keywords
VCS
bugtrack_url
requirements	No requirements were recorded.
Travis-CI	No Travis.
coveralls test coverage	No coveralls.

            # aldsim

Simple models for thin film growth using atomic layer deposition


## Motivation

Atomic layer deposition is a thin film growth technique that
relies on self-limited surface kinetics. It plays a key role
in areas such as microelectronics, and it is applied for energy,
energy storage, catalysis, and decarbonization applications.

`aldsim` implements a series of models to help explore ALD in 
various contexts and reactor configurations.

It has grown from a collection of papers that we have published over
the past 10 years.

## Status

`aldsim` is still in development. Over the next few months it will
be expanded to incorporate a variety of models. Please check aldsim's
documentation in [readthedocs](https://aldsim.readthedocs.io/en/latest/).


## Quick install

Through pypi:

```
pip install aldsim
```

## Usage

## Acknowledgements

Argonne's Laboratory Directed Research and Development program

## Copyright and license

Copyright © 2024, UChicago Argonne, LLC

`aldsim` is distributed under the terms of BSD License. 

Argonne Patent & Intellectual Property File Number: SF-24-041



            

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